JPH0219187B2 - - Google Patents

Info

Publication number
JPH0219187B2
JPH0219187B2 JP7119684A JP7119684A JPH0219187B2 JP H0219187 B2 JPH0219187 B2 JP H0219187B2 JP 7119684 A JP7119684 A JP 7119684A JP 7119684 A JP7119684 A JP 7119684A JP H0219187 B2 JPH0219187 B2 JP H0219187B2
Authority
JP
Japan
Prior art keywords
substrate
vapor
thermocouple
crucible
sheath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7119684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60215759A (ja
Inventor
Tateo Motoyoshi
Masahiro Hanai
Kenichiro Yamanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP7119684A priority Critical patent/JPS60215759A/ja
Publication of JPS60215759A publication Critical patent/JPS60215759A/ja
Publication of JPH0219187B2 publication Critical patent/JPH0219187B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7119684A 1984-04-09 1984-04-09 薄膜形成装置 Granted JPS60215759A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7119684A JPS60215759A (ja) 1984-04-09 1984-04-09 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7119684A JPS60215759A (ja) 1984-04-09 1984-04-09 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60215759A JPS60215759A (ja) 1985-10-29
JPH0219187B2 true JPH0219187B2 (en]) 1990-04-27

Family

ID=13453670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7119684A Granted JPS60215759A (ja) 1984-04-09 1984-04-09 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60215759A (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0453285U (en]) * 1990-09-11 1992-05-07
JPH0557008U (ja) * 1991-12-27 1993-07-30 日本道路興業株式会社 漢字とローマ字との併用標示による道路標識

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0165855U (en]) * 1987-10-20 1989-04-27
US4982696A (en) * 1988-01-08 1991-01-08 Ricoh Company, Ltd. Apparatus for forming thin film
US8261690B2 (en) * 2006-07-14 2012-09-11 Georgia Tech Research Corporation In-situ flux measurement devices, methods, and systems

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0453285U (en]) * 1990-09-11 1992-05-07
JPH0557008U (ja) * 1991-12-27 1993-07-30 日本道路興業株式会社 漢字とローマ字との併用標示による道路標識

Also Published As

Publication number Publication date
JPS60215759A (ja) 1985-10-29

Similar Documents

Publication Publication Date Title
US2489436A (en) Method and apparatus for producing neutrons
US3660158A (en) Thin film nickel temperature sensor and method of forming
US2842466A (en) Method of making p-nu junction semiconductor unit
JPH0219187B2 (en])
JPH0153351B2 (en])
US2821662A (en) Ion source
JPH051895Y2 (en])
JPS58161774A (ja) スパツタリング処理方法
JPH0676749A (ja) イオン源
JPS5668932A (en) Manufacture of magnetic recording medium
JP2549398B2 (ja) 二酸化硅素薄膜の成膜方法
JPS589981A (ja) 真空蒸着装置
JPH0238925Y2 (en])
JPS602745B2 (ja) イオン源装置
JPS5811009Y2 (ja) イオン源装置
JPS60226119A (ja) 薄膜形成装置
JPH04221066A (ja) 薄膜蒸着装置
SU1086969A1 (ru) Устройство дл облучени радиоактивными ионами
JPS63216251A (ja) ガスフエ−ズイオン源
JPS5840559Y2 (ja) イオン加速装置用イオン源
JPS60167249A (ja) 固体試料用電界電離イオン源
JPS63174242A (ja) エミツタチツプ処理装置
JPS589156B2 (ja) イオン化プレ−テイング装置
JPH0228226B2 (en])
JPH01283366A (ja) 薄膜形成装置